Name: Hyaluronic Acid Intensive Cream 100ml
Brand: COSRX
SKU: 8809416470122
Price: 28.52 NZD
Availability: InStock

COSRX

Hyaluronic Acid Intensive Cream 100ml

$28.52

~~$31.00~~

4 x $7.13 fortnightly with

Quantity :

Availability : 35 In Stock

Product Description

COSRX HYALURONIC ACID INTENSIVE CREAM

Superbly hydrating cream contains 3,000ppm of sodium hyaluronate to deeply moisturize skin and help strengthen its moisture barrier to prevent water loss and dryness. The formula also repairs dry and damaged skin. Lightweight texture is non-sticky and leaves no residue.

Intensely hydrating cream boosts moisture content in your skin and seals it inside, protecting your skin from further loss of hydration.

Highly concentrated with hippophae rhamnoides water and hyaluronic acid, COSRX Hyaluronic Acid Intensive Cream is a nourishing moisturizer perfect for dry/dehydrated skin as hyaluronic acid holds on to moisture and keeps the skin hydrated. Without feeling oily or heavy, this intensively hydrating cream makes the skin feel soft like clouds and provides long-lasting moisture.

Hyaluronic acid also helps reduce the apperance of fine wrinkles by filling in the skin with moisture.

The skin will look much plumper, smoother, and more glowy.

100ml

HOW TO USE

1. After cleansing and toning, gently apply a proper amount of the cream to face, avoiding the eye and mouth area.

2. Tap the area where the cream was applied gently in order for it to be absorbed along the skin texture.

INGREDIENTS

Hippophae Rhamnoides Water, Glycerin, Butylene Glycol, Caprylic/Capric Triglyceride, Betaine, Helianthus Annuus (Sunflower) Seed Oil, Cetearyl Alcohol, Cetearyl Olivate, Sorbitan Olivate, Macadamia Ternifolia Seed Oil, 1,2-Hexanediol, Sodium Hyaluronate, Arginine, Panthenol, Dimethicone, Ethylhexylglycerin, Carbomer, Allantoin, Xanthan Gum, Ethyl Hexandiol

PLEASE NOTE

Ingredients are subject to change at manufacturer's discretion. For the most complete and up-to date list of ingredients, please refer to the product packaging.